text:
Original jurisdiction of the Supreme Court of the United States
From Wikipedia, the free encyclopedia
Jump to: navigation, search
The original jurisdiction of the Supreme Court of the United States is limited to a small class of cases described in Article III, section 2, of the United States Constitution,[1] and further delineated by statute.
Contents
[hide]
1 Authority
2 Cases
3 Procedure
4 References
Authority[edit]
The relevant constitutional clause states:
In all Cases affecting Ambassadors, other public Ministers and Consuls, and those in which a State shall be Party, the supreme Court shall have original Jurisdiction. In all the other Cases before mentioned, the supreme Court shall have appellate Jurisdiction, both as to Law and Fact, with such Exceptions, and under such Regulations as the Congress shall make.
Certain cases that have not been considered by a lower court may be heard by the Supreme Court in the first instance under what is termed original jurisdiction. The Supreme Court's authority in this respect is also derived from Article III of the Constitution, which states that the Supreme Court shall have original jurisdiction "in all cases affecting ambassadors, other public ministers and consuls, and those in which a state shall be party." The original jurisdiction of the Court is set forth in 28 U.S.C. § 1251. This statute provides further that, in the case of disputes between two or more states, the Supreme Court holds both original and exclusive jurisdiction and no lower court may hear such cases.
In one of its earliest cases, Chisholm v. Georgia,[2] the Court found this jurisdiction to be self-executing, so that no further Congressional action was required to permit the Court to exercise it.[3]
The constitutional grant of original jurisdiction to the Supreme Court can not be expanded by statute. In the case of Marbury v. Madison,[4] the newly elected President, Thomas Jefferson, ordered his acting Secretary of State not to deliver commissions for appointments that had been made by his predecessor, John Adams. One of these appointees, William Marbury, filed a petition for a writ of mandamus directly in the Supreme Court, on the jurisdictional grounds that the Judiciary Act of 1789 stated that the Supreme Court "shall have power to issue writs of prohibition to the district courts [...] and writs of mandamus [...] to any courts appointed, or persons holding office, under the authority of the United States". The Court, in its first exercise of judicial review over a statute enacted by Congress, held that this grant of power to the Supreme Court was beyond what the Constitution permitted, and that this language was therefore invalid as unconstitutional.[5][1]
Cases[edit]
The number of cases heard pursuant to the court's original jurisdiction "has always been a minute portion of its overall caseload",[1] generally including only one or two such cases per term.
Between 1789 and 1959, the Court issued written opinions in only 123 original cases. Since 1960, the Court has received fewer than 140 motions for leave to file original cases, nearly half of which were denied a hearing.[1]
Most of these cases have disputes over state boundaries and water rights. The Court has tended to decline other kinds of cases arising from disputes between the states.[1]
Examples of such cases include United States v. Texas,[6] a case to determine whether a parcel of land belonged to the United States or to Texas, and Virginia v. Tennessee,[7] a case turning on whether an incorrectly drawn boundary between two states can be changed by a state court, and whether the setting of the correct boundary requires Congressional approval. Two other original jurisdiction cases involve colonial era borders and rights under navigable waters in New Jersey v. Delaware,[8] and water rights between riparian states upstream of navigable waters in Kansas v. Colorado.[9]
Procedure[edit]
Because the nine-member Supreme Court is not well-suited to conducting pretrial proceedings or trials, original jurisdiction cases accepted by the Court are typically referred to a well-qualified lawyer or lower-court judge to serve as special master, conduct the proceedings, and report recommendations to the Court. The Court then considers whether to accept the special master's report or whether to sustain any exceptions filed to the report.
Although it has not happened since 1794 in the case of Georgia v. Brailsford,[10][11] parties in an action at law in which the Supreme Court has original jurisdiction may request that a jury determine issues of fact.[12]
In 1950, in the case United States v. Louisiana,[13] the state of Louisiana moved for a jury trial, but the Court denied the motion, ruling that the suit was an equity action and not an action at law, and that therefore the Seventh Amendment guarantee of a jury trial did not apply. If a matter involving an action at law did come before the court, however, a jury might be empaneled. The Court noted in a footnote in the decision that under 28 U.S.C. 1872: "In all original actions at law in the Supreme Court against citizens of the United States, issues of fact shall be tried by a jury."[13] However, it did not decide whether the statute and the Seventh Amendment required such a jury.[13]
References[edit]
^ Jump up to: a b c d e "Jurisdiction: Original, Supreme Court". Federal Judicial Center.
Jump up ^ Chisholm v. Georgia, 2 U.S. (2 Dall.) 419 (1793).
Jump up ^ Kenneth R. Thomas, Larry M. Eig, The Constitution of the United States of America, Analysis and Interpretation (2013), p. 859.
Jump up ^ Marbury v. Madison, 5 U.S. (1 Cranch) 137 (1803).
Jump up ^ Kenneth R. Thomas, Larry M. Eig, The Constitution of the United States of America, Analysis and Interpretation (2013), p. 781.
Jump up ^ United States v. Texas, 579 U.S. ___ (2016).
Jump up ^ Virginia v. Tennessee, 148 U.S. 503 (1893).
Jump up ^ New Jersey v. Delaware, 552 U.S. 597 (2008)
Jump up ^ Kansas v. Colorado, 185 U.S. 125 (1902); 206 U.S. 46 (1907) ; 320 U.S. 383 (1943); 514 U.S. 673 (1995); 533 U.S. 1 (2001); 543 U.S. 86 (2004); 556 U.S. 98 (2009).
Jump up ^ James, Robert A. (1998). "Instructions in Supreme Court Jury Trials" (PDF). The Green Bag. 2d. 1 (4): 378. Retrieved February 5, 2013.
Jump up ^ Georgia v. Brailsford, Powell & Hopton , 3 U.S. 1 (1794).
Jump up ^ 28 U.S.C. § 1872 See Georgia v. Brailsford, 3 U.S. 1 (1794), in which the Court conducted a jury trial.
^ Jump up to: a b c United States v. Louisiana , 399 U.S. 699 (1950).
[hide]
v
t
e
Supreme Court of the United States
The Court
Lists of cases
Procedures
Supreme Court Building
Court demographics
Ideological leanings
Appointment and confirmation
Current members
Chief Justice
John Roberts
Associate Justices
Anthony Kennedy
Clarence Thomas
Ruth Bader Ginsburg
Stephen Breyer
Samuel Alito
Sonia Sotomayor
Elena Kagan
Neil Gorsuch
Retired Justices
John Paul Stevens
Sandra Day O'Connor
David Souter
Current nominations
No vacancies
History
Jay Court (1789–1795)
Rutledge Court (1795)
Ellsworth Court (1796–1800)
Marshall Court (1801–1835)
Taney Court (1836–1864)
Chase Court (1864–1873)
Waite Court (1874–1888)
Fuller Court (1888–1910)
White Court (1910–1921)
Taft Court (1921–1930)
Hughes Court (1930–1941)
Stone Court (1941–1946)
Vinson Court (1946–1953)
Warren Court (1953–1969)
Burger Court (1969–1986)
Rehnquist Court (1986–2005)
Roberts Court (2005–present)
Lists of justices
and nominees
Chief justices
Associate justices
All justices
court
seat
education
time in office
timelines
Justices who served in Congress
All nominations
Unsuccessful nominations
Nominations near end of presidency
Statutes affecting
Court size
Judiciary Act of 1789
Judiciary Act of 1801
Judiciary Act of 1802
Seventh Circuit Act of 1807
Eighth and Ninth Circuits Act of 1837
Tenth Circuit Act of 1863
Judicial Circuits Act of 1866
Judiciary Act of 1869
Court functionaries
Clerk
Marshal
Supreme Court Police
Reporter of Decisions
Lists of law clerks
Chief Justice
Seat 1
Seat 2
Seat 3
Seat 4
Seat 6
Seat 8
Seat 9
Seat 10
All
Former locations
Old City Hall, Philadelphia
Old Supreme Court Chamber, U.S. Capitol
Old Senate Chamber, U.S. Capitol
Related
United States Solicitor General
United States Reports
Lawyers' Edition
Amicus curiae
Article III, U.S. Constitution
Original jurisdiction
Burial places of justices
The Court in fiction
Other countries
Law Portal
Retrieved from "https://en.wikipedia.org/w/index.php?title=Original_jurisdiction_of_the_Supreme_Court_of_the_United_States&oldid=832367864"
Categories:
Supreme Court of the United States
Navigation menu
Personal tools
Not logged in
Talk
Contributions
Create account
Log in
Namespaces
Article
Talk
Variants
Views
Read
Edit
View history
More
Search
Navigation
Main page
Contents
Featured content
Current events
Random article
Donate to Wikipedia
Wikipedia store
Interaction
Help
About Wikipedia
Community portal
Recent changes
Contact page
Tools
What links here
Related changes
Upload file
Special pages
Permanent link
Page information
Wikidata item
Cite this page
Print/export
Create a book
Download as PDF
Printable version
Languages
Add links
This page was last edited on 25 March 2018, at 15:35.
Text is available under the Creative Commons Attribution-ShareAlike License; additional terms may apply. By using this site, you agree to the Terms of Use and Privacy Policy. Wikipedia® is a registered trademark of the Wikimedia Foundation, Inc., a non-profit organization.
Privacy policy
About Wikipedia
Disclaimers
Contact Wikipedia
Developers
Cookie statement
Mobile view
Enable previews

value: mw-page-base noprint

value: mw-head-base noprint

value: firstHeading firstHeading en

value: siteSub noprint

value: jump-to-nav mw-jump

attr: role tabindex class

value: button 0 togglelink

tag: span

attr: class dir xml:lang

value: toctitle ltr en

tag: li

value: Article Three of the United States Constitution

value:
/wiki/Writ_of_mandamus
mw-redirect
Writ of mandamus

value:
/wiki/Writs_of_mandamus
mw-redirect
Writs of mandamus

value: United States v. Louisiana (1950) (page does not exist)

value: Seventh Amendment to the United States Constitution

value: List of United States Supreme Court cases, volume 3

value: Lists of United States Supreme Court cases

value: Procedures of the Supreme Court of the United States

value: Demographics of the Supreme Court of the United States

value: Ideological leanings of U.S. Supreme Court justices

value: Appointment and confirmation to the Supreme Court of the United States

value:
navbox-image
10
width:1px;padding:0px 0px 0px 2px

value: Associate Justice of the Supreme Court of the United States

value: History of the Supreme Court of the United States

value: List of Justices of the Supreme Court of the United States by court composition

value: List of Justices of the Supreme Court of the United States by seat

value: List of law schools attended by United States Supreme Court Justices

value: List of United States Supreme Court Justices by time in office

value: List of United States Supreme Court Justices who also served in Congress

value: List of nominations to the Supreme Court of the United States

value: Unsuccessful nominations to the Supreme Court of the United States

value: List of people nominated to U.S. Supreme Court in last year of presidency

value: Clerk of the Supreme Court of the United States

value: Marshal of the United States Supreme Court

value: Reporter of Decisions of the Supreme Court of the United States

value: List of law clerks of the Supreme Court of the United States (Chief Justice)

value: List of law clerks of the Supreme Court of the United States (Seat 1)

value: List of law clerks of the Supreme Court of the United States (Seat 2)

value: List of law clerks of the Supreme Court of the United States (Seat 3)

value: List of law clerks of the Supreme Court of the United States (Seat 4)

value: List of law clerks of the Supreme Court of the United States (Seat 6)

value: List of law clerks of the Supreme Court of the United States (Seat 8)

value: List of law clerks of the Supreme Court of the United States (Seat 9)

value: List of law clerks of the Supreme Court of the United States (Seat 10)

value: List of burial places of Justices of the Supreme Court of the United States

value: Supreme Court of the United States in fiction

value: nowraplinks collapsible autocollapse navbox-inner

value: Category:Supreme Court of the United States

value:
catlinks mw-normal-catlinks
catlinks mw-normal-catlinks
interface

value: Discussion about edits from this IP address [ctrl-alt-n]

value: A list of edits made from this IP address [ctrl-alt-y]

value: You are encouraged to create an account and log in; however, it is not mandatory

value: You're encouraged to log in; however, it's not mandatory. [ctrl-alt-o]

value: Discussion about the content page [ctrl-alt-t]

value: p-namespaces navigation vectorTabs p-namespaces-label

value:
p-variants
navigation
vectorMenu emptyPortlet
p-variants-label

value: Past revisions of this page [ctrl-alt-h]

value: p-views navigation vectorTabs p-views-label

value:
p-cactions
navigation
vectorMenu emptyPortlet
p-cactions-label

value:
mw-wiki-logo
/wiki/Main_Page
Visit the main page

value:
/wiki/Main_Page
Visit the main page [ctrl-alt-z]
z

value: Featured content – the best of Wikipedia

value: Find background information on current events

value:
/wiki/Special:Random
Load a random article [ctrl-alt-x]
x

value: portal navigation p-navigation p-navigation-label

value: Guidance on how to use and edit Wikipedia

value: About the project, what you can do, where to find things

value: A list of recent changes in the wiki [ctrl-alt-r]

value: portal navigation p-interaction p-interaction-label

value: List of all English Wikipedia pages containing links to this page [ctrl-alt-j]

value: Recent changes in pages linked from this page [ctrl-alt-k]

value:
/wiki/Wikipedia:File_Upload_Wizard
Upload files [ctrl-alt-u]
u

value: A list of all special pages [ctrl-alt-q]

value: Permanent link to this revision of the page

value: Link to connected data repository item [ctrl-alt-g]

value: Printable version of this page [ctrl-alt-p]

value:
suggestions
display: none; font-size: 13px;

value: mediawiki ltr sitedir-ltr mw-hide-empty-elt ns-0 ns-subject page-Original_jurisdiction_of_the_Supreme_Court_of_the_United_States rootpage-Original_jurisdiction_of_the_Supreme_Court_of_the_United_States skin-vector action-view


text:
Federal Unemployment Tax Act
From Wikipedia, the free encyclopedia
Jump to: navigation, search
This article is part of a series on
Taxation in the
United States of America
Federal taxation[show]
Alternative minimum tax
Capital gains tax
Corporate tax
Estate tax
Excise tax
Gift tax
Income tax
Payroll tax
Internal Revenue Service (IRS)
Internal Revenue Code (IRC)
IRS tax forms
Revenue by state
History
Constitutional authority
Taxpayer standing
Court
Protest
Evasion
State and local taxation[show]
State income tax
Property tax
Sales tax
Use tax
Land value tax
State tax levels
Federal tax reform[show]
Automated payment transaction tax
9–9–9
Competitive Tax Plan
Efficient Taxation of Income
FairTax
Flat tax
Hall–Rabushka flat tax
Kemp Commission
Taxpayer Choice Act
USA Tax
Value added tax
Border-adjustment tax
United States portal
v
t
e
The Federal Unemployment Tax Act (or FUTA, I.R.C. ch. 23) is a United States federal law that imposes a federal employer tax used to help fund state workforce agencies. Employers report this tax by filing an annual Form 940 with the Internal Revenue Service. In some cases, the employer is required to pay the tax in installments during the tax year.
FUTA covers a federal share of the costs of administering the unemployment insurance (UI) and job service programs in every state. In addition, FUTA pays one-half of the cost of extended unemployment benefits (during periods of high unemployment) and provides for a fund from which states may borrow, if necessary, to pay benefits.
Contents
[hide]
1 Calculation of amount of tax
1.1 Credit Reduction
2 Wages exempt from FUTA
3 See also
4 Notes
5 External links
Calculation of amount of tax[edit]
Through June 30, 2011, the Federal Unemployment Tax Act imposed a tax of 6.2%, which was composed of a permanent rate of 6.0% and a temporary rate of 0.2%, which was passed by Congress in 1976. The temporary rate was extended many times, but it expired on June 30, 2011.
Consequently, for years through 2010 and the first six months of 2011, the FUTA imposed a 6.2% tax (before credits) on the first $7,000 of gross earnings of each worker per year.[1] Once the worker's earnings reach $7,000 during a given year, the employer no longer pays any Federal unemployment tax for that year with respect to that worker. Certain credits are allowed with respect to state unemployment taxes paid that may reduce the effective FUTA rate to 0.8%.
Effective July 1, 2011, the rate decreased to 6.0%. That rate may be reduced by an amount up to 5.4% through credits for contributions to state unemployment programs under sections 3302(a) and 3302(b), resulting in a minimum effective rate on and after July 1, 2011 of 0.6% (6.0% - 5.4%).[2][3]
Credit Reduction[edit]
The credit against the Federal tax may be reduced if the state has an outstanding advance (commonly called a “loan”). When states lack the funds to pay UI benefits, they may obtain loans from the federal government. To assure that these loans are repaid, and in accordance with Title XII of the Social Security Act, the federal government is entitled to recover those monies by reducing the FUTA credit it gives to employers, which is the equivalent of an overall increase in the FUTA tax. When a state has an outstanding loan balance on January 1 for two consecutive years, and the full amount of the loan is not repaid by November 10 of the second year, the FUTA credit will be reduced until the loan is repaid. This process is commonly called FUTA Credit Reduction and was designed as an involuntary repayment mechanism. The reduction schedule is 0.3% for the first year and an additional 0.3% for each succeeding year until the loan is repaid. From the third year onward, there may be additional reduction(s) in the FUTA tax credit (commonly dubbed "add-ons"). For example, for taxable years 2012 and 2013, Virgin Islands had a "2.7 add-on" when its tax rate on total wages was below a national minimum. For taxable year 2014, Connecticut had a "BCR add-on" when its tax rate on the taxable portion of covered wages in the previous calendar year is less than the 5-year benefit cost ratio applicable for the taxable year.
Based on their loan status on November 10, 2016, California and Virgin Islands are the only two states/jurisdiction that will receive reduced FUTA Credit for taxable year 2016. Employers in these states will pay extra FUTA taxes that are effective retroactively to January 1, 2016.
Below is a list of FUTA Credit Reduction states for taxable year 2009 through 2016, and their respective reduction amounts (in %):
State or District
2009
2010
2011
2012
2013
2014
2015
2016[4]
Arizona – – – 0.3 – – – –
Arkansas – – 0.3 0.6 0.9 – – –
California – – 0.3 0.6 0.9 1.2 1.5 1.8
Connecticut – – 0.3 0.6 0.9 1.7 2.1 –
Delaware – – – 0.3 0.6 – – –
Florida – – 0.3 0.6 – – – –
Georgia – – 0.3 0.6 0.9 – – –
Illinois – – 0.3 – – – – –
Indiana – 0.3 0.6 0.9 1.2 1.5 – –
Kentucky – – 0.3 0.6 0.9 1.2 – –
Michigan 0.3 0.6 0.9 – – – – –
Minnesota – – 0.3 – – – – –
Missouri – – 0.3 0.6 0.9 – – –
North Carolina – – 0.3 0.6 0.9 1.2 – –
New Jersey – – 0.3 0.6 – – – –
Nevada – – 0.3 0.6 – – – –
New York – – 0.3 0.6 0.9 1.2 – –
Ohio – – 0.3 0.6 0.9 1.2 1.5 –
Pennsylvania – – 0.3 – – – – –
Rhode Island – – 0.3 0.6 0.9 – – –
South Carolina – 0.3 – – – – – –
Vermont – – – 0.3 – – – –
Virginia – – 0.3 – – – – –
Virgin Islands – – 0.3 1.5 1.2 1.2 1.5 1.8
Wisconsin – – 0.3 0.6 0.9 – – –
Wages exempt from FUTA[edit]
The following wages are exempt from Federal Unemployment Tax Act payments:
Wages for services performed outside the United States.[5]
Wages paid to a deceased employee or a deceased employee's estate in any year after the year of the employee's death.[5]
Wages paid by a parent to a child under age 21, paid by a child to a parent, or paid by one spouse to the other spouse.[5][6]
Wages paid by a foreign government or international organization.[5][7]
Wages paid by a state or local government or by the United States federal government.[5][8]
Wages paid by a hospital to interns.[5][9]
Wages paid to newspaper carriers under age 18.[5][10]
Wages paid by a school to a student of the school.[5][11]
Wages paid by an organized seasonal camp to a full-time student who worked fewer than 13 calendar weeks during the calendar year.[5][12]
Wages paid by non-profit organizations.[13][14]
See also[edit]
Surtax
Unemployment Trust Fund
Notes[edit]
Jump up ^ See 26 U.S.C. § 3301.
Jump up ^ Internal Revenue Service (October 28, 2015). "2015 Instructions for Form 940" (PDF). Retrieved February 21, 2016.
Jump up ^ Publication 15 (Circular E) for 2011, "Employer's Tax Guide", p. 29, Internal Revenue Service, U.S. Dep't of the Treasury; see also 26 U.S.C. § 3301.
Jump up ^ Employers in 2016 FUTA credit reduction states must adjust their unemployment tax liability on their Form 940
^ Jump up to: a b c d e f g h i "Publication 15: (Circular E) Employer's Tax Guide" (PDF). Internal Revenue Service. United States Department of the Treasury. 2009.
Jump up ^ "26 U.S. Code Section 3306(c)(B)(5)". Legal Information Institute. Retrieved August 18, 2015. service performed by an individual in the employ of his son, daughter, or spouse, and service performed by a child under the age of 21 in the employ of his father or mother
Jump up ^ "26 U.S. Code Section 3306(c)(B)(10) and (11)". Legal Information Institute. Retrieved August 18, 2015. service performed in the employ of a foreign government (including service as a consular or other officer or employee or a nondiplomatic representative); service performed in the employ of an instrumentality wholly owned by a foreign government if the service is of a character similar to that performed in foreign countries by employees of the United States Government or of an instrumentality thereof; and if the Secretary of State shall certify to the Secretary of the Treasury that the foreign government, with respect to whose instrumentality exemption is claimed, grants an equivalent exemption with respect to similar service performed in the foreign country by employees of the United States Government and of instrumentalities thereof
Jump up ^ "26 U.S. Code Section 3306(c)(B)(7)". Legal Information Institute. Retrieved August 18, 2015. service performed in the employ of a State, or any political subdivision thereof, or in the employ of an Indian tribe, or any instrumentality of any one or more of the foregoing which is wholly owned by one or more States or political subdivisions or Indian tribes; and any service performed in the employ of any instrumentality of one or more States or political subdivisions to the extent that the instrumentality is, with respect to such service, immune under the Constitution of the United States from the tax imposed by section 3301
Jump up ^ "26 U.S. Code Section 3306(c)(B)(13)". Legal Information Institute. Retrieved August 18, 2015. service performed as a student nurse in the employ of a hospital or a nurses' training school by an individual who is enrolled and is regularly attending classes in a nurses’ training school chartered or approved pursuant to State law; and service performed as an intern in the employ of a hospital by an individual who has completed a 4 years' course in a medical school chartered or approved pursuant to State law
Jump up ^ "26 U.S. Code Section 3306(c)(B)(15)". Legal Information Institute. Retrieved August 18, 2015. service performed by an individual under the age of 18 in the delivery or distribution of newspapers or shopping news, not including delivery or distribution to any point for subsequent delivery or distribution; [or] service performed by an individual in, and at the time of, the sale of newspapers or magazines to ultimate consumers, under an arrangement under which the newspapers or magazines are to be sold by him at a fixed price, his compensation being based on the retention of the excess of such price over the amount at which the newspapers or magazines are charged to him, whether or not he is guaranteed a minimum amount of compensation for such service, or is entitled to be credited with the unsold newspapers or magazines turned back
Jump up ^ "26 U.S. Code Section 3306(c)(B)(10)(B)". Legal Information Institute. Retrieved August 18, 2015.
Jump up ^ "26 U.S. Code Section 3306(c)(B)(20)". Legal Information Institute. Retrieved August 18, 2015. service performed by a full time student ... in the employ of an organized camp if such camp did not operate for more than 7 months in the calendar year and did not operate for more than 7 months in the preceding calendar year, or had average gross receipts for any 6 months in the preceding calendar year which were not more than 33 1/3 percent of its average gross receipts for the other 6 months in the preceding calendar year; and if such full time student performed services in the employ of such camp for less than 13 calendar weeks in such calendar year; or
Jump up ^ "Publication 15-A: Employer's Supplemental Tax Guide" (PDF). Internal Revenue Service. United States Department of the Treasury. 2009.
Jump up ^ "26 U.S. Code Section 3306(c)(B)(8)". Legal Information Institute. Retrieved August 18, 2015. service performed in the employ of a religious, charitable, educational, or other organization described in section 501(c)(3) which is exempt from income tax under section 501(a)
External links[edit]
Printable FUTA form 940 from IRS.gov
Information on unemployment taxes from DOL.gov
Three Tax Law Changes Accounting Pros Need to Know in 2015
Retrieved from "https://en.wikipedia.org/w/index.php?title=Federal_Unemployment_Tax_Act&oldid=805712395"
Categories:
United States federal taxation legislation
Unemployment in the United States
83rd United States Congress
Withholding taxes
Hidden categories:
United States federal legislation articles without infoboxes
Navigation menu
Personal tools
Not logged in
Talk
Contributions
Create account
Log in
Namespaces
Article
Talk
Variants
Views
Read
Edit
View history
More
Search
Navigation
Main page
Contents
Featured content
Current events
Random article
Donate to Wikipedia
Wikipedia store
Interaction
Help
About Wikipedia
Community portal
Recent changes
Contact page
Tools
What links here
Related changes
Upload file
Special pages
Permanent link
Page information
Wikidata item
Cite this page
Print/export
Create a book
Download as PDF
Printable version
Languages
Add links
This page was last edited on 17 October 2017, at 04:08.
Text is available under the Creative Commons Attribution-ShareAlike License; additional terms may apply. By using this site, you agree to the Terms of Use and Privacy Policy. Wikipedia® is a registered trademark of the Wikimedia Foundation, Inc., a non-profit organization.
Privacy policy
About Wikipedia
Disclaimers
Contact Wikipedia
Developers
Cookie statement
Mobile view
Enable previews

tag: div

attr: id class

value: mw-page-base noprint

key: html

type: local

value: mw-head-base noprint

tag: a

attr: id class lang

value: firstHeading firstHeading en

value: siteSub noprint

value: jump-to-nav mw-jump

attr: href title

tag: td

tag: tr

tag: br

tag: th

tag: img

attr: alt src width height srcset data-file-width data-file-height

value: Logo of the Internal Revenue Service.svg

attr: href class

attr: class id href

value: NavToggle NavToggle1 #

attr: class style

value: font-size: 105%; padding: 0.2em 0px 0.4em; text-align: center; display: none;

value:
/wiki/Automated_payment_transaction_tax
mw-redirect
Automated payment transaction tax

value:
/wiki/Value_added_tax
mw-redirect
Value added tax

attr: alt src width height class srcset data-file-width data-file-height

value: padding:0.3em 0.4em 0.3em;font-weight:bold;border-top: 1px solid #aaa; border-bottom: 1px solid #aaa;

value: float:right;clear:right;width:22.0em;margin:0 0 1.0em 1.0em;background:#f9f9f9;border:1px solid #aaa;padding:0.2em;border-spacing:0.4em 0;text-align:center;line-height:1.4em;font-size:88%

value:
/wiki/Unemployment_insurance
mw-redirect
Unemployment insurance

value: Edit section: Calculation of amount of tax

value:
headerSort
0
columnheader button
Sort ascending

value:
/wiki/Non-profit_organization
mw-redirect
Non-profit organization

value:
nofollow
external text
https://www.irs.gov/pub/irs-pdf/p15.pdf

value: Category:United States federal taxation legislation

value: Category:Unemployment in the United States

value: Category:United States federal legislation articles without infoboxes

value: Discussion about edits from this IP address [ctrl-alt-n]

value: A list of edits made from this IP address [ctrl-alt-y]

value: You are encouraged to create an account and log in; however, it is not mandatory

value: You're encouraged to log in; however, it's not mandatory. [ctrl-alt-o]

value:
/wiki/Federal_Unemployment_Tax_Act
View the content page [ctrl-alt-c]
c

value: Discussion about the content page [ctrl-alt-t]

value: p-namespaces navigation vectorTabs p-namespaces-label

value:
p-variants
navigation
vectorMenu emptyPortlet
p-variants-label

value: Past revisions of this page [ctrl-alt-h]

value: p-views navigation vectorTabs p-views-label

value:
p-cactions
navigation
vectorMenu emptyPortlet
p-cactions-label

value:
mw-wiki-logo
/wiki/Main_Page
Visit the main page

value:
/wiki/Main_Page
Visit the main page [ctrl-alt-z]
z

value: Featured content – the best of Wikipedia

value:
uls-settings-trigger
Language settings
0
button
true

value: /static/images/wikimedia-button-1.5x.png 1.5x, /static/images/wikimedia-button-2x.png 2x

value: /static/images/poweredby_mediawiki_132x47.png 1.5x, /static/images/poweredby_mediawiki_176x62.png 2x

value: mediawiki ltr sitedir-ltr mw-hide-empty-elt ns-0 ns-subject page-Federal_Unemployment_Tax_Act rootpage-Federal_Unemployment_Tax_Act skin-vector action-view


text:
Thin film
From Wikipedia, the free encyclopedia
Jump to: navigation, search
A thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness. The controlled synthesis of materials as thin films (a process referred to as deposition) is a fundamental step in many applications. A familiar example is the household mirror, which typically has a thin metal coating on the back of a sheet of glass to form a reflective interface. The process of silvering was once commonly used to produce mirrors, while more recently the metal layer is deposited using techniques such as sputtering. Advances in thin film deposition techniques during the 20th century have enabled a wide range of technological breakthroughs in areas such as magnetic recording media, electronic semiconductor devices, LEDs, optical coatings (such as antireflective coatings), hard coatings on cutting tools, and for both energy generation (e.g. thin-film solar cells) and storage (thin-film batteries). It is also being applied to pharmaceuticals, via thin-film drug delivery. A stack of thin films is called a multilayer.
In addition to their applied interest, thin films play an important role in the development and study of materials with new and unique properties. Examples include multiferroic materials, and superlattices that allow the study of quantum confinement by creating two-dimensional electron states.
Contents
[hide]
1 Deposition
1.1 Chemical deposition
1.2 Physical deposition
1.3 Growth modes
1.4 Epitaxy
2 Applications
2.1 Decorative coatings
2.2 Optical coatings
2.3 Protective coatings
2.4 Electrically operating coatings
2.5 Thin-film photovoltaic cells
2.6 Thin-film batteries
3 See also
4 References
5 Further reading
5.1 Textbooks
5.2 Historical
Deposition[edit]
The act of applying a thin film to a surface is thin-film deposition – any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. "Thin" is a relative term, but most deposition techniques control layer thickness within a few tens of nanometres. Molecular beam epitaxy, Langmuir-Blodgett method and atomic layer deposition allow a single layer of atoms or molecules to be deposited at a time.
It is useful in the manufacture of optics (for reflective, anti-reflective coatings or self-cleaning glass, for instance), electronics (layers of insulators, semiconductors, and conductors form integrated circuits), packaging (i.e., aluminium-coated PET film), and in contemporary art (see the work of Larry Bell). Similar processes are sometimes used where thickness is not important: for instance, the purification of copper by electroplating, and the deposition of silicon and enriched uranium by a CVD-like process after gas-phase processing.
Deposition techniques fall into two broad categories, depending on whether the process is primarily chemical or physical.[1]
Chemical deposition[edit]
Here, a fluid precursor undergoes a chemical change at a solid surface, leaving a solid layer. An everyday example is the formation of soot on a cool object when it is placed inside a flame. Since the fluid surrounds the solid object, deposition happens on every surface, with little regard to direction; thin films from chemical deposition techniques tend to be conformal, rather than directional.
Chemical deposition is further categorized by the phase of the precursor:
Plating relies on liquid precursors, often a solution of water with a salt of the metal to be deposited. Some plating processes are driven entirely by reagents in the solution (usually for noble metals), but by far the most commercially important process is electroplating. It was not commonly used in semiconductor processing for many years, but has seen a resurgence with more widespread use of chemical-mechanical polishing techniques.
Chemical solution deposition (CSD) or chemical bath deposition (CBD) uses a liquid precursor, usually a solution of organometallic powders dissolved in an organic solvent. This is a relatively inexpensive, simple thin-film process that produces stoichiometrically accurate crystalline phases. This technique is also known as the sol-gel method because the 'sol' (or solution) gradually evolves towards the formation of a gel-like diphasic system.
Langmuir-Blodgett method uses molecules floating on top of an aqueous subphase. The packing density of molecules is controlled, and the packed monolayer is transferred on a solid substrate by controlled withdrawal of the solid substrate from the subphase. This allows creating thin films of various molecules such as nanoparticles, polymers and lipids with controlled particle packing density and layer thickness.[2]
Spin coating or spin casting, uses a liquid precursor, or sol-gel precursor deposited onto a smooth, flat substrate which is subsequently spun at a high velocity to centrifugally spread the solution over the substrate. The speed at which the solution is spun and the viscosity of the sol determine the ultimate thickness of the deposited film. Repeated depositions can be carried out to increase the thickness of films as desired. Thermal treatment is often carried out in order to crystallize the amorphous spin coated film. Such crystalline films can exhibit certain preferred orientations after crystallization on single crystal substrates.[3]
Dip coating is similar to spin coating in that a liquid precursor or sol-gel precursor is deposited on a substrate, but in this case the substrate is completely submerged in the solution and then withdrawn under controlled conditions. By controlling the withdrawal speed, the evaporation conditions (principally the humidity, temperature) and the volatility/viscosity of the solvent, the film thickness, homogeneity and nanoscopic morphology are controlled. There are two evaporation regimes: the capillary zone at very low withdrawal speeds, and the draining zone at faster evaporation speeds.[4]
Chemical vapor deposition (CVD) generally uses a gas-phase precursor, often a halide or hydride of the element to be deposited. In the case of MOCVD, an organometallic gas is used. Commercial techniques often use very low pressures of precursor gas.
Plasma enhanced CVD (PECVD) uses an ionized vapor, or plasma, as a precursor. Unlike the soot example above, commercial PECVD relies on electromagnetic means (electric current, microwave excitation), rather than a chemical-reaction, to produce a plasma.
Atomic layer deposition (ALD) uses gaseous precursor to deposit conformal thin films one layer at a time. The process is split up into two half reactions, run in sequence and repeated for each layer, in order to ensure total layer saturation before beginning the next layer. Therefore, one reactant is deposited first, and then the second reactant is deposited, during which a chemical reaction occurs on the substrate, forming the desired composition. As a result of the stepwise, the process is slower than CVD, however it can be run at low temperatures, unlike CVD.
Physical deposition[edit]
Physical deposition uses mechanical, electromechanical or thermodynamic means to produce a thin film of solid. An everyday example is the formation of frost. Since most engineering materials are held together by relatively high energies, and chemical reactions are not used to store these energies, commercial physical deposition systems tend to require a low-pressure vapor environment to function properly; most can be classified as physical vapor deposition (PVD).
The material to be deposited is placed in an energetic, entropic environment, so that particles of material escape its surface. Facing this source is a cooler surface which draws energy from these particles as they arrive, allowing them to form a solid layer. The whole system is kept in a vacuum deposition chamber, to allow the particles to travel as freely as possible. Since particles tend to follow a straight path, films deposited by physical means are commonly directional, rather than conformal.
Examples of physical deposition include: A thermal evaporator that uses an electric resistance heater to melt the material and raise its vapor pressure to a useful range. This is done in a high vacuum, both to allow the vapor to reach the substrate without reacting with or scattering against other gas-phase atoms in the chamber, and reduce the incorporation of impurities from the residual gas in the vacuum chamber. Obviously, only materials with a much higher vapor pressure than the heating element can be deposited without contamination of the film. Molecular beam epitaxy is a particularly sophisticated form of thermal evaporation.
An electron beam evaporator fires a high-energy beam from an electron gun to boil a small spot of material; since the heating is not uniform, lower vapor pressure materials can be deposited. The beam is usually bent through an angle of 270° in order to ensure that the gun filament is not directly exposed to the evaporant flux. Typical deposition rates for electron beam evaporation range from 1 to 10 nanometres per second.
In molecular beam epitaxy (MBE), slow streams of an element can be directed at the substrate, so that material deposits one atomic layer at a time. Compounds such as gallium arsenide are usually deposited by repeatedly applying a layer of one element (i.e., gallium), then a layer of the other (i.e., arsenic), so that the process is chemical, as well as physical; this is known also as atomic layer deposition. The beam of material can be generated by either physical means (that is, by a furnace) or by a chemical reaction (chemical beam epitaxy).
Sputtering relies on a plasma (usually a noble gas, such as argon) to knock material from a "target" a few atoms at a time. The target can be kept at a relatively low temperature, since the process is not one of evaporation, making this one of the most flexible deposition techniques. It is especially useful for compounds or mixtures, where different components would otherwise tend to evaporate at different rates. Note, sputtering's step coverage is more or less conformal. It is also widely used in the optical media. The manufacturing of all formats of CD, DVD, and BD are done with the help of this technique. It is a fast technique and also it provides a good thickness control. Presently, nitrogen and oxygen gases are also being used in sputtering.
Pulsed laser deposition systems work by an ablation process. Pulses of focused laser light vaporize the surface of the target material and convert it to plasma; this plasma usually reverts to a gas before it reaches the substrate.[5]
Cathodic arc deposition (arc-PVD) which is a kind of ion beam deposition where an electrical arc is created that literally blasts ions from the cathode. The arc has an extremely high power density resulting in a high level of ionization (30–100%), multiply charged ions, neutral particles, clusters and macro-particles (droplets). If a reactive gas is introduced during the evaporation process, dissociation, ionization and excitation can occur during interaction with the ion flux and a compound film will be deposited.
Electrohydrodynamic deposition (electrospray deposition) is a relatively new process of thin-film deposition. The liquid to be deposited, either in the form of nanoparticle solution or simply a solution, is fed to a small capillary nozzle (usually metallic) which is connected to a high voltage. The substrate on which the film has to be deposited is connected to ground. Through the influence of electric field, the liquid coming out of the nozzle takes a conical shape (Taylor cone) and at the apex of the cone a thin jet emanates which disintegrates into very fine and small positively charged droplets under the influence of Rayleigh charge limit. The droplets keep getting smaller and smaller and ultimately get deposited on the substrate as a uniform thin layer.
Growth modes[edit]
Frank-van-der-Merwe mode
Stranski-Krastanow mode
Volmer-Weber mode
Frank-van-der-Merwe[6][7][8] ("layer-by-layer"). In this growth mode the adsorbate-surface and adsorbate-adsorbate interactions are balanced. This type of growth requires lattice matching, and hence considered an "ideal" growth mechanism.
Stranski–Krastanov growth[9] ("joint islands" or "layer-plus-island"). In this growth mode the adsorbate-surface interactions are stronger than adsorbate-adsorbate interactions.
Volmer-Weber[10] ("isolated islands"). In this growth mode the adsorbate-adsorbate interactions are stronger than adsorbate-surface interactions, hence "islands" are formed right away.
Epitaxy[edit]
Further information: Epitaxy
A subset of thin-film deposition processes and applications is focused on the so-called epitaxial growth of materials, the deposition of crystalline thin films that grow following the crystalline structure of the substrate. The term epitaxy comes from the Greek roots epi (ἐπί), meaning "above", and taxis (τάξις), meaning "an ordered manner". It can be translated as "arranging upon".
The term homoepitaxy refers to the specific case in which a film of the same material is grown on a crystalline substrate. This technology is used, for instance, to grow a film which is more pure than the substrate, has a lower density of defects, and to fabricate layers having different doping levels. Heteroepitaxy refers to the case in which the film being deposited is different than the substrate.
Techniques used for epitaxial growth of thin films include molecular beam epitaxy, chemical vapor deposition, and pulsed laser deposition.[11]
Applications[edit]
Decorative coatings[edit]
The usage of thin films for decorative coatings probably represents their oldest application. This encompasses ca. 100 nm thin gold leafs that were already used in ancient India more than 5000 years ago. It may also be understood as any form of painting, although this kind of work is generally considered as an arts craft rather than an engineering or scientific discipline. Today, thin-film materials of variable thickness and high refractive index like titanium dioxide are often applied for decorative coatings on glass for instance, causing a rainbow-color appearance like oil on water. In addition, intransparent gold-colored surfaces may either be prepared by sputtering of gold or titanium nitride.
Optical coatings[edit]
Further information: Optical coating
These layers serve in both reflective and refractive systems. Large-area (reflective) mirrors became available during the 19th century and were produced by sputtering of metallic silver or aluminum on glass. Refractive lenses for optical instruments like cameras and microscopes typically exhibit aberrations, i.e. non-ideal refractive behavior. While large sets of lenses had to be lined up along the optical path previously, nowadays, the coating of optical lenses with transparent multilayers of titanium dioxide, silicon nitride or silicon oxide etc. may correct these aberrations. A well-known example for the progress in optical systems by thin-film technology is represented by the only a few mm wide lens in smart phone cameras. Other examples are given by anti-reflection coatings on eyeglasses or solar panels.
Protective coatings[edit]
Thin films are often deposited to protect an underlying work piece from external influences. The protection may operate by minimizing the contact with the exterior medium in order to reduce the diffusion from the medium to the work piece or vice versa. For instance, plastic lemonade bottles are frequently coated by anti-diffusion layers to avoid the out-diffusion of CO2, into which carbonic acid decomposes that was introduced into the beverage under high pressure. Another example is represented by thin TiN films in microelectronic chips separating electrically conducting aluminum lines from the embedding insulator SiO2 in order to suppress the formation of Al2O3. Often, thin films serve as protection against abrasion between mechanically moving parts. Examples for the latter application are diamond-like carbon (DLC) layers used in car engines or thin films made of nanocomposites.
Electrically operating coatings[edit]
Laterally structured metal layer of an integrated circuit[12]
Thin layers from elemental metals like copper, aluminum, gold or silver etc. and alloys have found numerous applications in electrical devices. Due to their high electrical conductivity they are able to transport electrical currents or supply voltages. Thin metal layers serve in conventional electrical system, for instance, as Cu layers on printed circuit boards, as the outer ground conductor in coaxial cables and various other forms like sensors etc.[13] A major field of application became their use in integrated circuits, where the electrical network among active and passive devices like transistors and capacitors etc. is built up from thin Al or Cu layers. These layers dispose of thicknesses in the range of a few 100 nm up to a few µm, and they are often embedded into a few nm thin titanium nitride layers in order to block a chemical reaction with the surrounding dielectric like SiO2. The figure shows a micrograph of a laterally structured TiN/Al/TiN metal stack in a microelectronic chip.[12]
Thin-film photovoltaic cells[edit]
Further information: Thin film solar cell
Thin-film technologies are also being developed as a means of substantially reducing the cost of solar cells. The rationale for this is thin-film solar cells are cheaper to manufacture owing to their reduced material costs, energy costs, handling costs and capital costs. This is especially represented in the use of printed electronics (roll-to-roll) processes. Other thin-film technologies, that are still in an early stage of ongoing research or with limited commercial availability, are often classified as emerging or third generation photovoltaic cells and include, organic, dye-sensitized, and polymer solar cells, as well as quantum dot, copper zinc tin sulfide, nanocrystal and perovskite solar cells.
Thin-film batteries[edit]
Thin-film printing technology is being used to apply solid-state lithium polymers to a variety of substrates to create unique batteries for specialized applications. Thin-film batteries can be deposited directly onto chips or chip packages in any shape or size. Flexible batteries can be made by printing onto plastic, thin metal foil, or paper.[14]
See also[edit]
Coating
Dual-polarisation interferometry
Ellipsometry
Hydrogenography
Kelvin probe force microscope
Langmuir–Blodgett film
Layer by layer
Microfabrication
Organic LED
Sarfus
Thin-film interference
Thin-film optics
Thin-film solar cell
References[edit]
Jump up ^ Functional Polymer Films Eds. R. Advincula and W. Knoll – Wiley, 2011, ISBN 978-3527321902.
Jump up ^ Ariga, Katsuhiko; Yamauchi, Yusuke; Mori, Taizo; Hill, Jonathan P. (1 December 2013). "25th Anniversary Article: What Can Be Done with the Langmuir-Blodgett Method? Recent Developments and its Critical Role in Materials Science". Advanced Materials. 25 (45): 6477–6512. doi:10.1002/adma.201302283. ISSN 1521-4095.
Jump up ^ Hanaor, D; Triani G.; Sorrell C.C.; (2011). "Morphology and photocatalytic activity of highly oriented mixed phase titanium dioxide thin films". Surface and Coatings Technology:. 205 (12): 3658–3664. doi:10.1016/j.surfcoat.2011.01.007. CS1 maint: Multiple names: authors list (link)
Jump up ^ "M. Faustini, G. L. Drisko, C. Boissiere, D. Grosso Liquid deposition approaches to self-assembled periodic nanomasks, Scripta Materiala 2014.". https://www.researchgate.net/publication/256103949_Liquid_deposition_approaches_to_self-assembled_periodic_nanomasks. External link in |journal= (help)
Jump up ^ Rashidian Vaziri, M R. "Monte Carlo simulation of the subsurface growth mode during pulsed laser deposition". Journal of Applied Physics. 110: 043304. doi:10.1063/1.3624768.
Jump up ^ Frank, F. C.; van der Merwe, J. H. (1949). "One-Dimensional Dislocations. I. Static Theory". Proceedings of the Royal Society of London. Series A, Mathematical and Physical Sciences. 198 (1053): 205–216. Bibcode:1949RSPSA.198..205F. doi:10.1098/rspa.1949.0095. JSTOR 98165.
Jump up ^ Frank, F. C.; van der Merwe, J. H. (1949). "One-Dimensional Dislocations. II. Misfitting Monolayers and Oriented Overgrowth". Proceedings of the Royal Society of London. Series A, Mathematical and Physical Sciences. 198 (1053): 216–225. Bibcode:1949RSPSA.198..216F. doi:10.1098/rspa.1949.0096. JSTOR 98166.
Jump up ^ Frank, F. C.; van der Merwe, J. H. (1949). "One-Dimensional Dislocations. III. Influence of the Second Harmonic Term in the Potential Representation, on the Properties of the Model". Proceedings of the Royal Society of London. Series A, Mathematical and Physical Sciences. 200 (1060): 125–134. Bibcode:1949RSPSA.200..125F. doi:10.1098/rspa.1949.0163. JSTOR 98394.
Jump up ^ Stranski, I. N.; Krastanov, L. (1938). "Zur Theorie der orientierten Ausscheidung von Ionenkristallen aufeinander". Sitzungsber. Akad. Wiss. Wien. Math.-Naturwiss. 146: 797–810.
Jump up ^ Volmer, M.; Weber, A. (1926). "Keimbildung in übersättigten Gebilden". Z. Phys. Chem. 119: 277–301.
Jump up ^ Vaziri, M R R; et al. "Microscopic description of the thermalization process during pulsed laser deposition of aluminium in the presence of argon background gas". Journal of Physics D: Applied Physics. 43: 425205. doi:10.1088/0022-3727/43/42/425205. CS1 maint: Explicit use of et al. (link)
^ Jump up to: a b M. Birkholz; K.-E. Ehwald; D. Wolansky; I. Costina; C. Baristyran-Kaynak; M. Fröhlich; H. Beyer; A. Kapp; F. Lisdat (2010). "Corrosion-resistant metal layers from a CMOS process for bioelectronic applications" (PDF). Surf. Coat. Technol. 204 (12–13): 2055–2059. doi:10.1016/j.surfcoat.2009.09.075.
Jump up ^ G. Korotchenkov (2013). "Thin metal films". Handbook of Gas Sensor Materials. Integrated Analytical Systems. Springer. pp. 153–166. ISBN 978-1-4614-7164-6.
Jump up ^ Flexible Cell Construction. Mpoweruk.com. Retrieved on 2012-01-15.
Further reading[edit]
Textbooks[edit]
M. Birkholz, with contributions by P.F. Fewster and C. Genzel (2005). Thin Film Analysis by X-Ray Scattering. Weinheim: Wiley-VCH. ISBN 978-3-527-31052-4. Table of contents
M. Ohring (2001). Materials Science of Thin Films (2nd ed.). Boston: Academic Press. ISBN 9780125249751.
K. Seshan, ed. (2012). Handbook of Thin Film Deposition (3rd ed.). Amsterdam: Elsevier. ISBN 978-1-4377-7873-1. CS1 maint: Extra text: authors list (link)
Historical[edit]
D.M. Mattox (2003). The Foundations of Vacuum Coating Technology (PDF). Norwich: Noyes / William Andrew Publishing. ISBN 0-8155-1495-6.
Authority control
LCCN: sh85134864
GND: 4136925-7
SUDOC: 027282295
BNF: cb131627143 (data)
NDL: 00562857
Retrieved from "https://en.wikipedia.org/w/index.php?title=Thin_film&oldid=817961308"
Categories:
Artificial materials
Materials science
Nanotechnology
Thin films
Hidden categories:
CS1 maint: Multiple names: authors list
CS1 errors: external links
CS1 maint: Explicit use of et al.
Use dmy dates from December 2017
Pages using div col with deprecated parameters
CS1 maint: Extra text: authors list
Wikipedia articles with LCCN identifiers
Wikipedia articles with GND identifiers
Wikipedia articles with BNF identifiers
Navigation menu
Personal tools
Not logged in
Talk
Contributions
Create account
Log in
Namespaces
Article
Talk
Variants
Views
Read
Edit
View history
More
Search
Navigation
Main page
Contents
Featured content
Current events
Random article
Donate to Wikipedia
Wikipedia store
Interaction
Help
About Wikipedia
Community portal
Recent changes
Contact page
Tools
What links here
Related changes
Upload file
Special pages
Permanent link
Page information
Wikidata item
Cite this page
Print/export
Create a book
Download as PDF
Printable version
In other projects
Wikimedia Commons
Languages
العربية
Български
Deutsch
Eesti
Español
Français
Gaeilge
한국어
हिन्दी
Italiano
עברית
Magyar
日本語
Português
Русский
தமிழ்
Українська
Tiếng Việt
中文
10 more
Edit links
This page was last edited on 31 December 2017, at 16:44.
Text is available under the Creative Commons Attribution-ShareAlike License; additional terms may apply. By using this site, you agree to the Terms of Use and Privacy Policy. Wikipedia® is a registered trademark of the Wikimedia Foundation, Inc., a non-profit organization.
Privacy policy
About Wikipedia
Disclaimers
Contact Wikipedia
Developers
Cookie statement
Mobile view
Enable previews

value: mw-page-base noprint

value: mw-head-base noprint

value: firstHeading firstHeading en

value: siteSub noprint

value: jump-to-nav mw-jump

tag: b

attr: href class title

value: /wiki/Nanometer mw-redirect Nanometer

value:
/wiki/Magnetic_media
mw-redirect
Magnetic media

value:
/wiki/Thin-film_battery
mw-redirect
Thin-film battery

value:
/wiki/Quantum_confinement
mw-redirect
Quantum confinement

value:
/wiki/Substrate_(materials_science)
mw-redirect
Substrate (materials science)

value:
/wiki/Electrical_insulation
mw-redirect
Electrical insulation

value:
/wiki/Conductor_(material)
mw-redirect
Conductor (material)

value:
/wiki/Integrated_circuits
mw-redirect
Integrated circuits

value:
/wiki/Larry_bell_(artist)
mw-redirect
Larry bell (artist)

value:
/wiki/Chemical-mechanical_polishing
mw-redirect
Chemical-mechanical polishing

value: Plasma Enhanced Chemical Vapor Deposition

value:
/wiki/Solar_panels
mw-redirect
Solar panels

value: Edit section: Electrically operating coatings

value:
/wiki/Electrical_conductivity
mw-redirect
Electrical conductivity

value:
/wiki/Printed_circuit_boards
mw-redirect
Printed circuit boards

value: Edit section: Thin-film photovoltaic cells

value:
/wiki/Thin_film_solar_cell
mw-redirect
Thin film solar cell

value:
/wiki/Solar_cells
mw-redirect
Solar cells

value:
/wiki/Polymer_solar_cell
mw-redirect
Polymer solar cell

value:
/wiki/Lithium_polymer
mw-redirect
Lithium polymer

value:
/wiki/Dual-polarisation_interferometry
mw-redirect
Dual-polarisation interferometry

value:
/wiki/Organic_LED
mw-redirect
Organic LED

value: div-col columns column-count column-count-3

value: -moz-column-count: 3; -webkit-column-count: 3; column-count: 3;

value:
nofollow
external text
//doi.org/10.1002%2Fadma.201302283

value:
nofollow
external text
//www.worldcat.org/issn/1521-4095

value:
nofollow
external text
http://handle.unsw.edu.au/1959.4/52449

value: Category:CS1 maint: Multiple names: authors list

value:
nofollow
external text
//doi.org/10.1063%2F1.3624768

value:
nofollow
external text
//doi.org/10.1098%2Frspa.1949.0095

value:
nofollow
external text
//www.jstor.org/stable/98165

value:
nofollow
external text
//doi.org/10.1098%2Frspa.1949.0096

value:
nofollow
external text
//www.jstor.org/stable/98166

value:
nofollow
external text
//doi.org/10.1098%2Frspa.1949.0163

value:
nofollow
external text
//www.jstor.org/stable/98394

value: Category:CS1 maint: Explicit use of et al.

value: Category:CS1 maint: Extra text: authors list

value:
nofollow
external text
https://d-nb.info/gnd/4136925-7

value:
nofollow
external text
https://www.idref.fr/027282295

value: Category:Use dmy dates from December 2017

value: Category:Pages using div col with deprecated parameters

value: Category:Wikipedia articles with LCCN identifiers

value: Category:Wikipedia articles with GND identifiers

value: Category:Wikipedia articles with BNF identifiers

value: Discussion about edits from this IP address [ctrl-alt-n]

value: A list of edits made from this IP address [ctrl-alt-y]

value:
/wiki/Thin_film
View the content page [ctrl-alt-c]
c

value: Find background information on current events

value:
/wiki/Special:Random
Load a random article [ctrl-alt-x]
x

value: portal navigation p-navigation p-navigation-label

value: Guidance on how to use and edit Wikipedia

value: About the project, what you can do, where to find things

value: A list of recent changes in the wiki [ctrl-alt-r]

value: portal navigation p-interaction p-interaction-label

value: List of all English Wikipedia pages containing links to this page [ctrl-alt-j]

value: Recent changes in pages linked from this page [ctrl-alt-k]

value:
/wiki/Wikipedia:File_Upload_Wizard
Upload files [ctrl-alt-u]
u

value: A list of all special pages [ctrl-alt-q]

value: Permanent link to this revision of the page

value: Link to connected data repository item [ctrl-alt-g]

value: Printable version of this page [ctrl-alt-p]

value: portal navigation p-wikibase-otherprojects p-wikibase-otherprojects-label

value: غشاء رقيق – Arabic

value: Тънки слоеве – Bulgarian

value:
interlanguage-link interwiki-bg
display: none;

value:
interlanguage-link interwiki-et
display: none;

value:
interlanguage-link interwiki-ga
display: none;

value:
interlanguage-link interwiki-ko
display: none;

value: तनुफिल्म – Hindi

value:
interlanguage-link interwiki-it
display: none;

value: סרט דק – Hebrew

value:
interlanguage-link interwiki-he
display: none;

value:
interlanguage-link interwiki-hu
display: none;

value: Тонкие плёнки – Russian

value: மென் படலம் – Tamil

value:
interlanguage-link interwiki-ta
display: none;

value: Тонка плівка – Ukrainian

value:
interlanguage-link interwiki-uk
display: none;

value:
interlanguage-link interwiki-vi
display: none;

value: All languages (initial selection from common choices by you and others)

value:
suggestions
display: none; font-size: 13px;

value: mediawiki ltr sitedir-ltr mw-hide-empty-elt ns-0 ns-subject page-Thin_film rootpage-Thin_film skin-vector action-view