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Jan 7

MatchAnything: Universal Cross-Modality Image Matching with Large-Scale Pre-Training

Image matching, which aims to identify corresponding pixel locations between images, is crucial in a wide range of scientific disciplines, aiding in image registration, fusion, and analysis. In recent years, deep learning-based image matching algorithms have dramatically outperformed humans in rapidly and accurately finding large amounts of correspondences. However, when dealing with images captured under different imaging modalities that result in significant appearance changes, the performance of these algorithms often deteriorates due to the scarcity of annotated cross-modal training data. This limitation hinders applications in various fields that rely on multiple image modalities to obtain complementary information. To address this challenge, we propose a large-scale pre-training framework that utilizes synthetic cross-modal training signals, incorporating diverse data from various sources, to train models to recognize and match fundamental structures across images. This capability is transferable to real-world, unseen cross-modality image matching tasks. Our key finding is that the matching model trained with our framework achieves remarkable generalizability across more than eight unseen cross-modality registration tasks using the same network weight, substantially outperforming existing methods, whether designed for generalization or tailored for specific tasks. This advancement significantly enhances the applicability of image matching technologies across various scientific disciplines and paves the way for new applications in multi-modality human and artificial intelligence analysis and beyond.

  • 7 authors
·
Jan 13, 2025 3

Addressing Class Imbalance and Data Limitations in Advanced Node Semiconductor Defect Inspection: A Generative Approach for SEM Images

Precision in identifying nanometer-scale device-killer defects is crucial in both semiconductor research and development as well as in production processes. The effectiveness of existing ML-based approaches in this context is largely limited by the scarcity of data, as the production of real semiconductor wafer data for training these models involves high financial and time costs. Moreover, the existing simulation methods fall short of replicating images with identical noise characteristics, surface roughness and stochastic variations at advanced nodes. We propose a method for generating synthetic semiconductor SEM images using a diffusion model within a limited data regime. In contrast to images generated through conventional simulation methods, SEM images generated through our proposed DL method closely resemble real SEM images, replicating their noise characteristics and surface roughness adaptively. Our main contributions, which are validated on three different real semiconductor datasets, are: i) proposing a patch-based generative framework utilizing DDPM to create SEM images with intended defect classes, addressing challenges related to class-imbalance and data insufficiency, ii) demonstrating generated synthetic images closely resemble real SEM images acquired from the tool, preserving all imaging conditions and metrology characteristics without any metadata supervision, iii) demonstrating a defect detector trained on generated defect dataset, either independently or combined with a limited real dataset, can achieve similar or improved performance on real wafer SEM images during validation/testing compared to exclusive training on a real defect dataset, iv) demonstrating the ability of the proposed approach to transfer defect types, critical dimensions, and imaging conditions from one specified CD/Pitch and metrology specifications to another, thereby highlighting its versatility.

  • 5 authors
·
Jul 14, 2024